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Journal: Coatings, 2025
Volume: 15
Number: 1228
1228
Article: Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography
Authors: by Yuna Hachikubo, Hiryu Hayashi, Mano Ando, Mayu Morita, Misaki Oshima, Abdul Manaf Hashim, Nurul Hanis Azhan, Takayuki Ota and Satoshi Takei
Link: https://www.mdpi.com/2079-6412/15/10/1228

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