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Journal: Coatings, 2023
Volume: 13
Number: 1184
1184
Article: Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor
Authors: by Bo Yang, Ni Yang, Dan Zhao, Fengyang Chen, Xingping Yuan, Yanqing Hou and Gang Xie
Link: https://www.mdpi.com/2079-6412/13/7/1184

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