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Alam S, Paul P, Beladiya V, Schmitt P, Stenzel O, Trost M, Wilbrandt S, Mühlig C, Schröder S, Matthäus G, et al. Heterostructure Films of SiO₂ and HfO₂ for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings. 2023; 13(2):278. https://doi.org/10.3390/coatings13020278

Alam, Shawon, Pallabi Paul, Vivek Beladiya, Paul Schmitt, Olaf Stenzel, Marcus Trost, Steffen Wilbrandt, Christian Mühlig, Sven Schröder, Gabor Matthäus, and et al. 2023. "Heterostructure Films of SiO₂ and HfO₂ for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition" Coatings 13, no. 2: 278. https://doi.org/10.3390/coatings13020278

Alam, S., Paul, P., Beladiya, V., Schmitt, P., Stenzel, O., Trost, M., Wilbrandt, S., Mühlig, C., Schröder, S., Matthäus, G., Nolte, S., Riese, S., Otto, F., Fritz, T., Gottwald, A., & Szeghalmi, A. (2023). Heterostructure Films of SiO₂ and HfO₂ for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings, 13(2), 278. https://doi.org/10.3390/coatings13020278