Article Versions Notes

Wu P-H, Chiu K-A, Shih F-H, Fang Y-S, Do T-H, Chen W-C, Chang L. Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001). Coatings. 2023; 13(1):183. https://doi.org/10.3390/coatings13010183

Wu, Ping-Hsun, Kun-An Chiu, Fu-Han Shih, Yu-Siang Fang, Thi-Hien Do, Wei-Chun Chen, and Li Chang. 2023. "Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)" Coatings 13, no. 1: 183. https://doi.org/10.3390/coatings13010183

Wu, P.-H., Chiu, K.-A., Shih, F.-H., Fang, Y.-S., Do, T.-H., Chen, W.-C., & Chang, L. (2023). Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001). Coatings, 13(1), 183. https://doi.org/10.3390/coatings13010183