Schurink, B.; van den Beld, W.T.E.; Tiggelaar, R.M.; van de Kruijs, R.W.E.; Bijkerk, F.
Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions. Coatings 2022, 12, 685.
https://doi.org/10.3390/coatings12050685
AMA Style
Schurink B, van den Beld WTE, Tiggelaar RM, van de Kruijs RWE, Bijkerk F.
Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions. Coatings. 2022; 12(5):685.
https://doi.org/10.3390/coatings12050685
Chicago/Turabian Style
Schurink, Bart, Wesley T. E. van den Beld, Roald M. Tiggelaar, Robbert W. E. van de Kruijs, and Fred Bijkerk.
2022. "Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions" Coatings 12, no. 5: 685.
https://doi.org/10.3390/coatings12050685
APA Style
Schurink, B., van den Beld, W. T. E., Tiggelaar, R. M., van de Kruijs, R. W. E., & Bijkerk, F.
(2022). Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions. Coatings, 12(5), 685.
https://doi.org/10.3390/coatings12050685