Metal Deposition Induced by the Step Region of Si (111)-(7 × 7) Surface

Scanning tunneling microscope results showed that Au and Fe atoms were steamed on the Si (111)-(7 × 7) substrate surface, with or without the step region. The experimental comparison proved that the induced effect of the step region is a controllable process, which CH₃OH can adjust. In this paper, the latest progress on the dynamic phenomenon on the step region is discussed, including three deposition types: strong deposition, weak deposition, and the new quasi deposition. With a relatively weak interaction between Au and Si atoms, the linearity of the weak deposition is present in the step region. In contrast, Fe atoms tend to form a strong deposition along the boundary line between the flat and step regions. Different depositions correspond to different surface potential energy: a newly formed surface is stabilized by a quasi-potential made by breaking, and a metal atomic structure can be stabilized by forming several quasi depositions. After discussing the good adsorption properties, CH₃OH can be used as an intermediate layer on the step region. As an important result of quasi deposition, a regular linear Fe cluster structure is created, which is perpendicular to the boundary line.