Order Article Reprints

Castillo-Saenz J, Nedev N, Valdez-Salas B, Curiel-Alvarez M, Mendivil-Palma MI, Hernandez-Como N, Martinez-Puente M, Mateos D, Perez-Landeros O, Martinez-Guerra E. Properties of Al₂O₃ Thin Films Grown by PE-ALD at Low Temperature Using H₂O and O₂ Plasma Oxidants. Coatings. 2021; 11(10):1266. https://doi.org/10.3390/coatings11101266

Castillo-Saenz, Jhonathan, Nicola Nedev, Benjamín Valdez-Salas, Mario Curiel-Alvarez, María Isabel Mendivil-Palma, Norberto Hernandez-Como, Marcelo Martinez-Puente, David Mateos, Oscar Perez-Landeros, and Eduardo Martinez-Guerra. 2021. "Properties of Al₂O₃ Thin Films Grown by PE-ALD at Low Temperature Using H₂O and O₂ Plasma Oxidants" Coatings 11, no. 10: 1266. https://doi.org/10.3390/coatings11101266

Castillo-Saenz, J., Nedev, N., Valdez-Salas, B., Curiel-Alvarez, M., Mendivil-Palma, M. I., Hernandez-Como, N., Martinez-Puente, M., Mateos, D., Perez-Landeros, O., & Martinez-Guerra, E. (2021). Properties of Al₂O₃ Thin Films Grown by PE-ALD at Low Temperature Using H₂O and O₂ Plasma Oxidants. Coatings, 11(10), 1266. https://doi.org/10.3390/coatings11101266