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Open AccessArticle

Nanopillar Diffraction Gratings by Two-Photon Lithography

1
INM—Leibniz Institute for New Materials, Campus D2 2, 66123 Saarbrücken, Germany
2
Department of Materials Science and Engineering, Saarland University, 66123 Saarbrücken, Germany
3
Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, UK
*
Authors to whom correspondence should be addressed.
Nanomaterials 2019, 9(10), 1495; https://doi.org/10.3390/nano9101495
Received: 7 September 2019 / Revised: 15 October 2019 / Accepted: 15 October 2019 / Published: 19 October 2019
(This article belongs to the Special Issue Dynamics and Applications of Photon-Nanostructured Systems)
Two-dimensional photonic structures such as nanostructured pillar gratings are useful for various applications including wave coupling, diffractive optics, and security features. Two-photon lithography facilitates the generation of such nanostructured surfaces with high precision and reproducibility. In this work, we report on nanopillar diffraction gratings fabricated by two-photon lithography with various laser powers close to the polymerization threshold of the photoresist. As a result, defect-free arrays of pillars with diameters down to 184 nm were fabricated. The structure sizes were analyzed by scanning electron microscopy and compared to theoretical predictions obtained from Monte Carlo simulations. The optical reflectivities of the nanopillar gratings were analyzed by optical microscopy and verified by rigorous coupled-wave simulations. View Full-Text
Keywords: nanostructures; optical pillar gratings; photonic crystals; two-photon lithography; direct laser writing nanostructures; optical pillar gratings; photonic crystals; two-photon lithography; direct laser writing
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MDPI and ACS Style

Purtov, J.; Rogin, P.; Verch, A.; Johansen, V.E.; Hensel, R. Nanopillar Diffraction Gratings by Two-Photon Lithography. Nanomaterials 2019, 9, 1495.

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