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Journal: NanomaterialsVolume: 13Number: 731
Article: H2 Plasma and PMA Effects on PEALD-Al2O3 Films with Different O2 Plasma Exposure Times for CIS Passivation Layers
  • Authors:
  • Jehyun An1,
  • Kyeongkeun Choi2 and
  • Jongseo Park1
  • et al.
Link: https://www.mdpi.com/2079-4991/13/4/731

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