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Journal: Nanomaterials, 2022
Volume: 12
Number: 3798
3798
Article: Influence of Additive N₂ on O₂ Plasma Ashing Process in Inductively Coupled Plasma
Authors: by Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi and Shin-Jae You
Link: https://www.mdpi.com/2079-4991/12/21/3798

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