Order Article Reprints

Aguila MAC, Esmenda JC, Wang J-Y, Chen Y-C, Lee T-H, Yang C-Y, Lin K-H, Chang-Liao K-S, Kafanov S, Pashkin YA, et al. Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators. Nanomaterials. 2022; 12(15):2675. https://doi.org/10.3390/nano12152675

Aguila, Myrron Albert Callera, Joshoua Condicion Esmenda, Jyh-Yang Wang, Yen-Chun Chen, Teik-Hui Lee, Chi-Yuan Yang, Kung-Hsuan Lin, Kuei-Shu Chang-Liao, Sergey Kafanov, Yuri A. Pashkin, and et al. 2022. "Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators" Nanomaterials 12, no. 15: 2675. https://doi.org/10.3390/nano12152675

Aguila, M. A. C., Esmenda, J. C., Wang, J.-Y., Chen, Y.-C., Lee, T.-H., Yang, C.-Y., Lin, K.-H., Chang-Liao, K.-S., Kafanov, S., Pashkin, Y. A., & Chen, C.-D. (2022). Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators. Nanomaterials, 12(15), 2675. https://doi.org/10.3390/nano12152675