Article Versions Notes

Du Y, Wang G, Miao Y, Xu B, Li B, Kong Z, Yu J, Zhao X, Lin H, Su J, et al. Strain Modulation of Selectively and/or Globally Grown Ge Layers. Nanomaterials. 2021; 11(6):1421. https://doi.org/10.3390/nano11061421

Du, Yong, Guilei Wang, Yuanhao Miao, Buqing Xu, Ben Li, Zhenzhen Kong, Jiahan Yu, Xuewei Zhao, Hongxiao Lin, Jiale Su, and et al. 2021. "Strain Modulation of Selectively and/or Globally Grown Ge Layers" Nanomaterials 11, no. 6: 1421. https://doi.org/10.3390/nano11061421

Du, Y., Wang, G., Miao, Y., Xu, B., Li, B., Kong, Z., Yu, J., Zhao, X., Lin, H., Su, J., Han, J., Liu, J., Dong, Y., Wang, W., & Radamson, H. H. (2021). Strain Modulation of Selectively and/or Globally Grown Ge Layers. Nanomaterials, 11(6), 1421. https://doi.org/10.3390/nano11061421