Müller, M.; Bouša, M.; Hájková, Z.; Ledinský, M.; Fejfar, A.; Drogowska-Horná, K.; Kalbáč, M.; Frank, O.
Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene. Nanomaterials 2020, 10, 589.
https://doi.org/10.3390/nano10030589
AMA Style
Müller M, Bouša M, Hájková Z, Ledinský M, Fejfar A, Drogowska-Horná K, Kalbáč M, Frank O.
Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene. Nanomaterials. 2020; 10(3):589.
https://doi.org/10.3390/nano10030589
Chicago/Turabian Style
Müller, Martin, Milan Bouša, Zdeňka Hájková, Martin Ledinský, Antonín Fejfar, Karolina Drogowska-Horná, Martin Kalbáč, and Otakar Frank.
2020. "Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene" Nanomaterials 10, no. 3: 589.
https://doi.org/10.3390/nano10030589
APA Style
Müller, M., Bouša, M., Hájková, Z., Ledinský, M., Fejfar, A., Drogowska-Horná, K., Kalbáč, M., & Frank, O.
(2020). Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene. Nanomaterials, 10(3), 589.
https://doi.org/10.3390/nano10030589