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Journal: Nanomaterials, 2020
Volume: 10
Number: 384
384
Article: Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction
Authors: by Maximilian Lederer, Thomas Kämpfe, Norman Vogel, Dirk Utess, Beate Volkmann, Tarek Ali, Ricardo Olivo, Johannes Müller, Sven Beyer, Martin Trentzsch, Konrad Seidel and Lukas M. Eng
Link: https://www.mdpi.com/2079-4991/10/2/384

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