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Kafle B, Ridoy AI, Miethig E, Clochard L, Duffy E, Hofmann M, Rentsch J. On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas. Nanomaterials. 2020; 10(11):2214. https://doi.org/10.3390/nano10112214

Kafle, Bishal, Ahmed Ismail Ridoy, Eleni Miethig, Laurent Clochard, Edward Duffy, Marc Hofmann, and Jochen Rentsch. 2020. "On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas" Nanomaterials 10, no. 11: 2214. https://doi.org/10.3390/nano10112214

Kafle, B., Ridoy, A. I., Miethig, E., Clochard, L., Duffy, E., Hofmann, M., & Rentsch, J. (2020). On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas. Nanomaterials, 10(11), 2214. https://doi.org/10.3390/nano10112214