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Journal: Nanomaterials, 2020
Volume: 10
Number: 2214
2214
Article: On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas
Authors: by Bishal Kafle, Ahmed Ismail Ridoy, Eleni Miethig, Laurent Clochard, Edward Duffy, Marc Hofmann and Jochen Rentsch
Link: https://www.mdpi.com/2079-4991/10/11/2214

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