Chargui, A.; El Beainou, R.; Mosset, A.; Euphrasie, S.; Potin, V.; Vairac, P.; Martin, N.
Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films. Nanomaterials 2020, 10, 81.
https://doi.org/10.3390/nano10010081
AMA Style
Chargui A, El Beainou R, Mosset A, Euphrasie S, Potin V, Vairac P, Martin N.
Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films. Nanomaterials. 2020; 10(1):81.
https://doi.org/10.3390/nano10010081
Chicago/Turabian Style
Chargui, Asma, Raya El Beainou, Alexis Mosset, Sébastien Euphrasie, Valérie Potin, Pascal Vairac, and Nicolas Martin.
2020. "Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films" Nanomaterials 10, no. 1: 81.
https://doi.org/10.3390/nano10010081
APA Style
Chargui, A., El Beainou, R., Mosset, A., Euphrasie, S., Potin, V., Vairac, P., & Martin, N.
(2020). Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films. Nanomaterials, 10(1), 81.
https://doi.org/10.3390/nano10010081