Radamson, H.H.; Zhang, Y.; He, X.; Cui, H.; Li, J.; Xiang, J.; Liu, J.; Gu, S.; Wang, G.
The Challenges of Advanced CMOS Process from 2D to 3D. Appl. Sci. 2017, 7, 1047.
https://doi.org/10.3390/app7101047
AMA Style
Radamson HH, Zhang Y, He X, Cui H, Li J, Xiang J, Liu J, Gu S, Wang G.
The Challenges of Advanced CMOS Process from 2D to 3D. Applied Sciences. 2017; 7(10):1047.
https://doi.org/10.3390/app7101047
Chicago/Turabian Style
Radamson, Henry H., Yanbo Zhang, Xiaobin He, Hushan Cui, Junjie Li, Jinjuan Xiang, Jinbiao Liu, Shihai Gu, and Guilei Wang.
2017. "The Challenges of Advanced CMOS Process from 2D to 3D" Applied Sciences 7, no. 10: 1047.
https://doi.org/10.3390/app7101047
APA Style
Radamson, H. H., Zhang, Y., He, X., Cui, H., Li, J., Xiang, J., Liu, J., Gu, S., & Wang, G.
(2017). The Challenges of Advanced CMOS Process from 2D to 3D. Applied Sciences, 7(10), 1047.
https://doi.org/10.3390/app7101047