Min, D.K.; Woo, J.; Kim, J.; Lee, B.-J.; Jeon, E.-c.; Lee, J.
The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000. Appl. Sci. 2025, 15, 1441.
https://doi.org/10.3390/app15031441
AMA Style
Min DK, Woo J, Kim J, Lee B-J, Jeon E-c, Lee J.
The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000. Applied Sciences. 2025; 15(3):1441.
https://doi.org/10.3390/app15031441
Chicago/Turabian Style
Min, Dae Kee, Jiyun Woo, Jinwook Kim, Bong-Jae Lee, Eui-chan Jeon, and Joohee Lee.
2025. "The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000" Applied Sciences 15, no. 3: 1441.
https://doi.org/10.3390/app15031441
APA Style
Min, D. K., Woo, J., Kim, J., Lee, B.-J., Jeon, E.-c., & Lee, J.
(2025). The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000. Applied Sciences, 15(3), 1441.
https://doi.org/10.3390/app15031441