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Article

Optical Studies of Al2O3:ZnO and Al2O3:TiO2 Bilayer Films in UV-VIS-NIR Spectral Range

1
Faculty of Materials Engineering, Cracow University of Technology, Al. Jana Pawla II 37, 31-864 Cracow, Poland
2
Department of Physics, Cracow University of Technology, 1, Podchorazych Str., 30-084 Cracow, Poland
3
Department of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18a Str., 44-100 Gliwice, Poland
4
Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, Towarowa 7 Str., 44-100 Gliwice, Poland
5
Strata Mechanics Research Institute of the Polish Academy of Sciences, Reymonta 27, 30-059 Crakow, Poland
6
Faculty of Chemical Engineering and Technology, Cracow University of Technology, 24 Warszawska St., 31-155 Cracow, Poland
*
Author to whom correspondence should be addressed.
Appl. Sci. 2025, 15(24), 12870; https://doi.org/10.3390/app152412870 (registering DOI)
Submission received: 4 September 2025 / Revised: 1 December 2025 / Accepted: 2 December 2025 / Published: 5 December 2025
(This article belongs to the Section Optics and Lasers)

Abstract

In this work, the results of ellipsometric studies of bilayer films of broadband oxides (Al2O3:ZnO, Al2O3:TiO2) are presented. Thin layers of Al2O3,ZnO and TiO2 were deposited on silicon substrate using the atomic layer deposition (ALD) method. The desired ranges of antireflective properties were selected, and then, based on optical modeling, the appropriate thicknesses of individual layers were determined. Optical constants were determined based on ellipsometric measurements in the spectral range of 193–1690 nm. For several selected samples, this range has been extended to 470–6500 cm−1. B-spline function, Tauc–Lorentz, Cody–Lorentz and Psemi-M0 oscillator models were used to describe the optical properties of the investigated films. Reflectance spectra for layers on a silicon substrate were determined in the range from 200 to 2500 nm. Additionally, complementary studies, SEM and EDS analyses, were also performed. The EDS investigations enabled the determination of the composition of the bilayer films. Spectrophotometric analysis demonstrated consistency between the obtained experimental data and theoretical predictions, confirming the validity of the applied model. The studies showed significant improvement in antireflective properties depending on the thickness of the prepared layers while maintaining an extinction coefficient close to zero, across much of the investigated spectral range, regardless of the layer thickness.
Keywords: spectroscopic ellipsometry; bilayer dielectric films; ALD deposition; ZnO; Al2O3; TiO2 spectroscopic ellipsometry; bilayer dielectric films; ALD deposition; ZnO; Al2O3; TiO2

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MDPI and ACS Style

Tram, M.; Nosidlak, N.; Szindler, M.M.; Szindler, M.; Tokarczyk, K.; Dulian, P.; Jaglarz, J. Optical Studies of Al2O3:ZnO and Al2O3:TiO2 Bilayer Films in UV-VIS-NIR Spectral Range. Appl. Sci. 2025, 15, 12870. https://doi.org/10.3390/app152412870

AMA Style

Tram M, Nosidlak N, Szindler MM, Szindler M, Tokarczyk K, Dulian P, Jaglarz J. Optical Studies of Al2O3:ZnO and Al2O3:TiO2 Bilayer Films in UV-VIS-NIR Spectral Range. Applied Sciences. 2025; 15(24):12870. https://doi.org/10.3390/app152412870

Chicago/Turabian Style

Tram, Maciej, Natalia Nosidlak, Magdalena M. Szindler, Marek Szindler, Katarzyna Tokarczyk, Piotr Dulian, and Janusz Jaglarz. 2025. "Optical Studies of Al2O3:ZnO and Al2O3:TiO2 Bilayer Films in UV-VIS-NIR Spectral Range" Applied Sciences 15, no. 24: 12870. https://doi.org/10.3390/app152412870

APA Style

Tram, M., Nosidlak, N., Szindler, M. M., Szindler, M., Tokarczyk, K., Dulian, P., & Jaglarz, J. (2025). Optical Studies of Al2O3:ZnO and Al2O3:TiO2 Bilayer Films in UV-VIS-NIR Spectral Range. Applied Sciences, 15(24), 12870. https://doi.org/10.3390/app152412870

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