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Journal: Appl. Sci., 2025
Volume: 15
Number: 9122

Article: Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism
Authors: by Yuanhao Zhang, Hyo Jun Sim, Jong Jin Hwang and Seung Jae Moon
Link: https://www.mdpi.com/2076-3417/15/16/9122

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