A Soft Measurement Method for the Tail Diameter in the Growing Process of Czochralski Silicon Single Crystals

Round 1

Reviewer 1 Report

In this paper, the authors claim to have developed a new soft measurement technique which can measure the tail diameter of Czochralski single crystals.

Although extensive work has been performed in the current paper to develop an algorithm for soft measuring, there seems to be an inconsistency in the motivation and the actual results, as well as the overall claim.

In the introduction the authors mention that the current issue with the crystal growth industry is the precise measurement of crystals tails, particularly when the crystal is too small to observe using conventional camera systems. Moreover, the issue becomes more complex with fluctuating processing conditions. The authors have concluded that they have developed an soft measurement technique to overcome these current issues; however, it seems that the technique is rather a prediction technique rather than a in-situ measurement technique . Therefore, it seems that the initial issue indicated by the authors have not been resolved. Such as, 

・Measurements in this study are conducted in several tens of millimeters. Is this considered "precise"?

・Does not seem that parameter fluctuations are simulated, rather just tested for multiple samples produced under the same condition? Additionally, can this algorithm predict the tail length for a specific processing parameter? 

By addressing such issues, this work may be acceptable in the future; however, the title and aim of the project should be significantly altered.

Author Response

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Author Response File: Author Response.pdf

Reviewer 2 Report

The article entitled "A soft measurement method for tail diameter in the growing process of Czochralski silicon single crystal" is an important study and provided valuable data for the semiconductor community
Recommend to publish with minor revision with the following comments:
In the introduction why tail diameter measurement is required is not clear. Please add more information with reference.
Fig.7:Provide the X- and Y-axis title
Fig.8: In the MIV vs. Delaying order (speed and temperature case), can there be a mathemetical relation be used to fit the graph? If so please include information while explaining the data.

Minor English correction needed.

Author Response

Please see the attachment.

Author Response File: Author Response.pdf

Reviewer 3 Report

This study introduced a soft measurement model, DBN-ACO-SVR, for accurately determining the diameter of the crystal during the tail process of Czochralski silicon single-crystal growth.  Due to the long length of the data provided, I attempted to identify issues and areas worth questioning, but various data made me believe that the conclusion of this work is credible. I suggest that this work be published in applied sciences. 

A few changes are suggested - 

1. Authors should provide some background about the Czochralski method and/or a Schematic diagram of Czochralski (HWC) crystal growth system. 

2. Figures 5-11, text is too small to read.

3. RMSE of prediction results based on different networks for different lots- It should have been tested on a larger number of lots to demonstrate the reliability of this method. 

4. Describe RMSE in text.

No comments

Author Response

Please see the attachment.

Author Response File: Author Response.pdf

Round 2

Reviewer 1 Report

Revisions are satisfactory. 

Revisions are satisfactory.