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Open AccessArticle

Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics

1
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
2
Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
*
Authors to whom correspondence should be addressed.
Appl. Sci. 2020, 10(18), 6438; https://doi.org/10.3390/app10186438
Received: 27 July 2020 / Revised: 6 September 2020 / Accepted: 9 September 2020 / Published: 16 September 2020
Among a series of 3D printing techniques, stereolithography provides a new route to produce ceramic architectures with the advantages of high-precision and short cycle time. However, up to now the stereolithography of non-oxide ceramics still face complex and difficult problems. This work focused on the analysis of rheological and curing ability of Si3N4 photocurable slurries. The effects of monomer type, coarse silicon powder, solid loading and ambient temperature on the rheological behavior were intensively studied. The relationships between powder characteristic (involving refractive index, absorbance and the introduce of coarse silicon powder), monomer type and curing ability were discussed in detail. It is expected that this study may benefit the development of Si3N4 or other non-oxide ceramic slurries for stereolithography. View Full-Text
Keywords: silicon nitride; ceramic stereolithography; rheological performance; curing properties silicon nitride; ceramic stereolithography; rheological performance; curing properties
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MDPI and ACS Style

Li, X.; Zhang, J.; Duan, Y.; Liu, N.; Jiang, J.; Ma, R.; Xi, H.; Li, X. Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics. Appl. Sci. 2020, 10, 6438.

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