Zhu, T.; Wang, Z.; McMullen, L.M.; Raivio, T.; Simpson, D.J.; Gänzle, M.G.
Contribution of the Locus of Heat Resistance to Growth and Survival of Escherichia coli at Alkaline pH and at Alkaline pH in the Presence of Chlorine. Microorganisms 2021, 9, 701.
https://doi.org/10.3390/microorganisms9040701
AMA Style
Zhu T, Wang Z, McMullen LM, Raivio T, Simpson DJ, Gänzle MG.
Contribution of the Locus of Heat Resistance to Growth and Survival of Escherichia coli at Alkaline pH and at Alkaline pH in the Presence of Chlorine. Microorganisms. 2021; 9(4):701.
https://doi.org/10.3390/microorganisms9040701
Chicago/Turabian Style
Zhu, Tongbo, Zhiying Wang, Lynn M. McMullen, Tracy Raivio, David J. Simpson, and Michael G. Gänzle.
2021. "Contribution of the Locus of Heat Resistance to Growth and Survival of Escherichia coli at Alkaline pH and at Alkaline pH in the Presence of Chlorine" Microorganisms 9, no. 4: 701.
https://doi.org/10.3390/microorganisms9040701
APA Style
Zhu, T., Wang, Z., McMullen, L. M., Raivio, T., Simpson, D. J., & Gänzle, M. G.
(2021). Contribution of the Locus of Heat Resistance to Growth and Survival of Escherichia coli at Alkaline pH and at Alkaline pH in the Presence of Chlorine. Microorganisms, 9(4), 701.
https://doi.org/10.3390/microorganisms9040701