Article Versions Notes

Terekhov VA, Terukov EI, Undalov YK, Barkov KA, Kurilo NA, Ivkov SA, Nesterov DN, Seredin PV, Goloshchapov DL, Minakov DA, et al. Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition. Symmetry. 2023; 15(9):1800. https://doi.org/10.3390/sym15091800

Terekhov, Vladimir A., Evgeniy I. Terukov, Yurii K. Undalov, Konstantin A. Barkov, Nikolay A. Kurilo, Sergey A. Ivkov, Dmitry N. Nesterov, Pavel V. Seredin, Dmitry L. Goloshchapov, Dmitriy A. Minakov, and et al. 2023. "Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition" Symmetry 15, no. 9: 1800. https://doi.org/10.3390/sym15091800

Terekhov, V. A., Terukov, E. I., Undalov, Y. K., Barkov, K. A., Kurilo, N. A., Ivkov, S. A., Nesterov, D. N., Seredin, P. V., Goloshchapov, D. L., Minakov, D. A., Popova, E. V., Lukin, A. N., & Trapeznikova, I. N. (2023). Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition. Symmetry, 15(9), 1800. https://doi.org/10.3390/sym15091800