Mossotti, G.; Piscitelli, A.; Catania, F.; Aronne, M.; Galfré, G.; Lamberti, A.; Ferrero, S.; Scaltrito, L.; Bertana, V.
Advances in Water Resource Management: An In Situ Sensor Solution for Monitoring High Concentrations of Chromium in the Electroplating Industry. Water 2024, 16, 1167.
https://doi.org/10.3390/w16081167
AMA Style
Mossotti G, Piscitelli A, Catania F, Aronne M, Galfré G, Lamberti A, Ferrero S, Scaltrito L, Bertana V.
Advances in Water Resource Management: An In Situ Sensor Solution for Monitoring High Concentrations of Chromium in the Electroplating Industry. Water. 2024; 16(8):1167.
https://doi.org/10.3390/w16081167
Chicago/Turabian Style
Mossotti, Giulia, Andrea Piscitelli, Felice Catania, Matilde Aronne, Giulio Galfré, Andrea Lamberti, Sergio Ferrero, Luciano Scaltrito, and Valentina Bertana.
2024. "Advances in Water Resource Management: An In Situ Sensor Solution for Monitoring High Concentrations of Chromium in the Electroplating Industry" Water 16, no. 8: 1167.
https://doi.org/10.3390/w16081167
APA Style
Mossotti, G., Piscitelli, A., Catania, F., Aronne, M., Galfré, G., Lamberti, A., Ferrero, S., Scaltrito, L., & Bertana, V.
(2024). Advances in Water Resource Management: An In Situ Sensor Solution for Monitoring High Concentrations of Chromium in the Electroplating Industry. Water, 16(8), 1167.
https://doi.org/10.3390/w16081167
