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Journal: Polymers, 2024
Volume: 16
Number: 1943
Article:
Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing
Authors:
by
Xiao Cheng, Jenny Tempeler, Serhiy Danylyuk, Alexander Böker and Larisa Tsarkova
Link:
https://www.mdpi.com/2073-4360/16/13/1943
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