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Journal: Polymers, 2020
Volume: 12
Number: 2359

Article: Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
Authors: by Vitor Vlnieska, Margarita Zakharova, Andrey Mikhaylov and Danays Kunka
Link: https://www.mdpi.com/2073-4360/12/10/2359

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