Next Article in Journal
A Label-Free Fluorescent Aptasensor for Detection of Staphylococcal Enterotoxin A Based on Aptamer-Functionalized Silver Nanoclusters
Previous Article in Journal
Fabrication and Optimization of the Thermo-Sensitive Hydrogel Carboxymethyl Cellulose/Poly(N-isopropylacrylamide-co-acrylic acid) for U(VI) Removal from Aqueous Solution
Open AccessArticle

One-Step Photocontrolled Polymerization-Induced Self-Assembly (Photo-PISA) by Using In Situ Bromine-Iodine Transformation Reversible-Deactivation Radical Polymerization

State and Local Joint Engineering Laboratory for Novel Functional Polymeric Materials, Jiangsu Key Laboratory of Advanced Functional Polymer Design and Application, Suzhou Key Laboratory of Macromolecular Design and Precision Synthesis, College of Chemistry, Chemical Engineering and Materials Science, Soochow University, 199 Ren-ai Road, Suzhou 215123, China
*
Authors to whom correspondence should be addressed.
Haihui Li, Qinghua Xu and Xiang Xu contributed equally to this work.
Polymers 2020, 12(1), 150; https://doi.org/10.3390/polym12010150 (registering DOI)
Received: 10 December 2019 / Revised: 31 December 2019 / Accepted: 6 January 2020 / Published: 7 January 2020
(This article belongs to the Section Polymer Synthesis)
Polymerization-induced self-assembly (PISA) has become an effective strategy to synthesize high solid content polymeric nanoparticles with various morphologies in situ. In this work, one-step PISA was achieved by in situ photocontrolled bromine-iodine transformation reversible-deactivation radical polymerization (hereinafter referred to as Photo-BIT-RDRP). The water-soluble macroinitiator precursor α-bromophenylacetate polyethylene glycol monomethyl ether ester (mPEG1k-BPA) was synthesized in advance, and then the polymer nanomicelles (mPEG1k-b-PBnMA and mPEG1k-b-PHPMA, where BnMA means benzyl methacrylate and HPMA is hydroxypropyl methacrylate) were successfully formed from a PISA process of hydrophobic monomer of BnMA or HPMA under irradiation with blue LED light at room temperature. In addition, the typical living features of the photocontrolled PISA process were confirmed by the linear increase of molecular weights of the resultant amphiphilic block copolymers with monomer conversions and narrow molecular weight distributions (Mw/Mn < 1.20). Importantly, the photocontrolled PISA process is realized by only one-step method by using in situ photo-BIT-RDRP, which avoids the use of transition metal catalysts in the traditional ATRP system, and simplifies the synthesis steps of nanomicelles. This strategy provides a promising pathway to solve the problem of active chain end (C-I) functionality loss in two-step polymerization of BIT-RDRP. View Full-Text
Keywords: photopolymerization; reversible-deactivation radical polymerization (RDRP); polymerization-induced self-assembly (PISA); bromine-iodine transformation; photocontrolled photopolymerization; reversible-deactivation radical polymerization (RDRP); polymerization-induced self-assembly (PISA); bromine-iodine transformation; photocontrolled
Show Figures

Graphical abstract

MDPI and ACS Style

Li, H.; Xu, Q.; Xu, X.; Zhang, L.; Cheng, Z.; Zhu, X. One-Step Photocontrolled Polymerization-Induced Self-Assembly (Photo-PISA) by Using In Situ Bromine-Iodine Transformation Reversible-Deactivation Radical Polymerization. Polymers 2020, 12, 150.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Back to TopTop