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Tip-Based Nanofabrication for Scalable Manufacturing

Stencil Lithography for Scalable Micro- and Nanomanufacturing

Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA
Department of Chemistry, University of California, Berkeley, CA 94720, USA
Northrop Grumman Mission Systems, Advanced Technology Labs, Linthicum, MD 21090, USA
Author to whom correspondence should be addressed.
Academic Editor: Franck Chollet
Micromachines 2017, 8(4), 131;
Received: 14 March 2017 / Revised: 7 April 2017 / Accepted: 13 April 2017 / Published: 19 April 2017
(This article belongs to the Special Issue Scalable Micro/Nano Patterning)
In this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro- and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method. View Full-Text
Keywords: stencil lithography; scalable; micropatterning; nanopatterning stencil lithography; scalable; micropatterning; nanopatterning
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MDPI and ACS Style

Du, K.; Ding, J.; Liu, Y.; Wathuthanthri, I.; Choi, C.-H. Stencil Lithography for Scalable Micro- and Nanomanufacturing. Micromachines 2017, 8, 131.

AMA Style

Du K, Ding J, Liu Y, Wathuthanthri I, Choi C-H. Stencil Lithography for Scalable Micro- and Nanomanufacturing. Micromachines. 2017; 8(4):131.

Chicago/Turabian Style

Du, Ke, Junjun Ding, Yuyang Liu, Ishan Wathuthanthri, and Chang-Hwan Choi. 2017. "Stencil Lithography for Scalable Micro- and Nanomanufacturing" Micromachines 8, no. 4: 131.

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