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Open AccessArticle

Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers

1
Department of Mechanical Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, IL 61801, USA
2
Department of Material Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, IL 61801, USA
*
Author to whom correspondence should be addressed.
These authors contributed equally to this work.
Academic Editors: Chang-Hwan Choi and Ishan Wathuthanthri
Micromachines 2017, 8(1), 18; https://doi.org/10.3390/mi8010018
Received: 14 November 2016 / Revised: 27 December 2016 / Accepted: 5 January 2017 / Published: 10 January 2017
(This article belongs to the Special Issue Scalable Micro/Nano Patterning)
Colloidal quantum dots (QDs) with properties that can be tuned by size, shape, and composition are promising for the next generation of photonic and electronic devices. However, utilization of these materials in such devices is hindered by the limited compatibility of established semiconductor processing techniques. In this context, patterning of QD films formed from colloidal solutions is a critical challenge and alternative methods are currently being developed for the broader adoption of colloidal QDs in functional devices. Here, we present a solvent-free approach to patterning QD films by utilizing a shape memory polymer (SMP). The high pull-off force of the SMP below glass transition temperature (Tg) in conjunction with the conformal contact at elevated temperatures (above Tg) enables large-area, rate-independent, fine patterning while preserving desired properties of QDs. View Full-Text
Keywords: colloidal quantum dots; shape memory polymer; patterning colloidal quantum dots; shape memory polymer; patterning
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MDPI and ACS Style

Keum, H.; Jiang, Y.; Park, J.K.; Flanagan, J.C.; Shim, M.; Kim, S. Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers. Micromachines 2017, 8, 18. https://doi.org/10.3390/mi8010018

AMA Style

Keum H, Jiang Y, Park JK, Flanagan JC, Shim M, Kim S. Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers. Micromachines. 2017; 8(1):18. https://doi.org/10.3390/mi8010018

Chicago/Turabian Style

Keum, Hohyun; Jiang, Yiran; Park, Jun K.; Flanagan, Joseph C.; Shim, Moonsub; Kim, Seok. 2017. "Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers" Micromachines 8, no. 1: 18. https://doi.org/10.3390/mi8010018

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