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Open AccessEditorial
Micromachines 2015, 6(6), 790-792;

Special Issue: 15 Years of SU8 as MEMS Material

Microsystems Laboratory (LMIS4), École Polytechnique Fédérale de Lausanne (EPFL), Station 17, 1015 Lausanne, Switzerland
Author to whom correspondence should be addressed.
Received: 15 June 2015 / Revised: 19 June 2015 / Accepted: 19 June 2015 / Published: 19 June 2015
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
Full-Text   |   PDF [624 KB, uploaded 19 June 2015]
Note: In lieu of an abstract, this is an excerpt from the first page.


In 1997, the first paper using SU-8 as a material for microfabrication was published [1], demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components.[...] View Full-Text
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Bertsch, A.; Renaud, P. Special Issue: 15 Years of SU8 as MEMS Material. Micromachines 2015, 6, 790-792.

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