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Article

Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime

1
Centre of Micro/Nano Manufacturing Technology, University College Dublin, D04 V1W8 Dublin, Ireland
2
Institute for Materials and Processes, University of Edinburgh, Edinburgh EH9 3FB, UK
3
Surface Engineering and Precision Institute, Cranfield University, Cranfield MK43 0AL, UK
4
Department of Mechanical Engineering, University of Bath, Bath BA2 7AY, UK
*
Author to whom correspondence should be addressed.
Micromachines 2021, 12(7), 834; https://doi.org/10.3390/mi12070834
Submission received: 15 June 2021 / Revised: 7 July 2021 / Accepted: 14 July 2021 / Published: 18 July 2021
(This article belongs to the Special Issue Feature Papers of Micromachines in Materials and Processing 2021)

Abstract

This paper focuses on the power dissipation of a plasma torch used for an optical surface fabrication process. The process utilizes an inductively coupled plasma (ICP) torch that is equipped with a De-Laval nozzle for the delivery of a highly collimated plasma jet. The plasma torch makes use of a self-igniting coil and an intermediate co-axial tube made of alumina. The torch has a distinctive thermal and electrical response compared to regular ICP torches. In this study, the results of the power dissipation investigation reveal the true efficiency of the torch and discern its electrical response. By systematically measuring the coolant parameters (temperature change and flow rate), the power dissipation is extrapolated. The radio frequency power supply is set to 800 W, E mode, throughout the research presented in this study. The analytical results of power dissipation, derived from the experiments, show that 15.4% and 33.3% are dissipated by the nozzle and coil coolant channels, respectively. The experiments also enable the determination of the thermal time constant of the plasma torch for the entire range of RF power.
Keywords: heat transfer; plasma processing; inductively coupled plasma heat transfer; plasma processing; inductively coupled plasma

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MDPI and ACS Style

Yu, N.; Jourdain, R.; Gourma, M.; Xu, F.; Bennett, A.; Fang, F. Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime. Micromachines 2021, 12, 834. https://doi.org/10.3390/mi12070834

AMA Style

Yu N, Jourdain R, Gourma M, Xu F, Bennett A, Fang F. Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime. Micromachines. 2021; 12(7):834. https://doi.org/10.3390/mi12070834

Chicago/Turabian Style

Yu, Nan, Renaud Jourdain, Mustapha Gourma, Fangda Xu, Adam Bennett, and Fengzhou Fang. 2021. "Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime" Micromachines 12, no. 7: 834. https://doi.org/10.3390/mi12070834

APA Style

Yu, N., Jourdain, R., Gourma, M., Xu, F., Bennett, A., & Fang, F. (2021). Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime. Micromachines, 12(7), 834. https://doi.org/10.3390/mi12070834

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