Berger, L.; Jurczyk, J.; Madajska, K.; Szymańska, I.B.; Hoffmann, P.; Utke, I.
Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate. Micromachines 2021, 12, 580.
https://doi.org/10.3390/mi12050580
AMA Style
Berger L, Jurczyk J, Madajska K, Szymańska IB, Hoffmann P, Utke I.
Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate. Micromachines. 2021; 12(5):580.
https://doi.org/10.3390/mi12050580
Chicago/Turabian Style
Berger, Luisa, Jakub Jurczyk, Katarzyna Madajska, Iwona B. Szymańska, Patrik Hoffmann, and Ivo Utke.
2021. "Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate" Micromachines 12, no. 5: 580.
https://doi.org/10.3390/mi12050580
APA Style
Berger, L., Jurczyk, J., Madajska, K., Szymańska, I. B., Hoffmann, P., & Utke, I.
(2021). Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate. Micromachines, 12(5), 580.
https://doi.org/10.3390/mi12050580