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Article

Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

1
Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
2
Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
3
Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
*
Author to whom correspondence should be addressed.
Academic Editor: Rosa Córdoba
Micromachines 2021, 12(2), 115; https://doi.org/10.3390/mi12020115
Received: 31 December 2020 / Revised: 18 January 2021 / Accepted: 19 January 2021 / Published: 22 January 2021
(This article belongs to the Special Issue Nanofabrication with Focused Electron/Ion Beam Induced Processing)
Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes down to the sub-20 nm range. While indispensably needed for some concepts (e.g., 3D nano-plasmonics), the final applications can also be limited due to low mechanical rigidity, and thermal- or electric conductivities. To optimize these properties, without changing the overall 3D architecture, a controlled method for tuning individual branch diameters is desirable. Following this motivation, here, we introduce on-purpose beam blurring for controlled upward scaling and study the behavior at different inclination angles. The study reveals a massive boost in growth efficiencies up to a factor of five and the strong delay of unwanted proximal growth. In doing so, this work expands the design flexibility of this technology. View Full-Text
Keywords: 3D-nanoprinting; additive manufacturing; direct-write manufacturing; metallic nanostructures; helices; nanowires; focused electron beam induced deposition; platinum 3D-nanoprinting; additive manufacturing; direct-write manufacturing; metallic nanostructures; helices; nanowires; focused electron beam induced deposition; platinum
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MDPI and ACS Style

Seewald, L.M.; Winkler, R.; Kothleitner, G.; Plank, H. Expanding 3D Nanoprinting Performance by Blurring the Electron Beam. Micromachines 2021, 12, 115. https://doi.org/10.3390/mi12020115

AMA Style

Seewald LM, Winkler R, Kothleitner G, Plank H. Expanding 3D Nanoprinting Performance by Blurring the Electron Beam. Micromachines. 2021; 12(2):115. https://doi.org/10.3390/mi12020115

Chicago/Turabian Style

Seewald, Lukas M., Robert Winkler, Gerald Kothleitner, and Harald Plank. 2021. "Expanding 3D Nanoprinting Performance by Blurring the Electron Beam" Micromachines 12, no. 2: 115. https://doi.org/10.3390/mi12020115

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