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Erratum

Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799

1
Instituto de Ciencia de Materiales de Aragón (ICMA, CSIC-Universidad de Zaragoza) and Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad de Zaragoza, Calle Pedro Cerbuna 12, 50009 Zaragoza, Spain
2
Laboratorio de Microscopías Avanzadas (LMA), Instituto de Nanociencia de Aragón (INA), Edificio de I+D, Campus Río Ebro, 50018 Zaragoza, Spain
3
Instituto de Ciencia Molecular, Universitat de València, Catedrático José Beltrán 2, 46980 Paterna, Spain
4
Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
*
Author to whom correspondence should be addressed.
Micromachines 2020, 11(2), 211; https://doi.org/10.3390/mi11020211
Received: 17 January 2020 / Accepted: 19 January 2020 / Published: 18 February 2020
Note: In lieu of an abstract, this is an excerpt from the first page.

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MDPI and ACS Style

De Teresa, J.M.; Orús, P.; Córdoba, R.; Philipp, P. Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. Micromachines 2020, 11, 211. https://doi.org/10.3390/mi11020211

AMA Style

De Teresa JM, Orús P, Córdoba R, Philipp P. Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. Micromachines. 2020; 11(2):211. https://doi.org/10.3390/mi11020211

Chicago/Turabian Style

De Teresa, José M., Pablo Orús, Rosa Córdoba, and Patrick Philipp. 2020. "Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799" Micromachines 11, no. 2: 211. https://doi.org/10.3390/mi11020211

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