De Teresa, J.M.; Orús, P.; Córdoba, R.; Philipp, P.
Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. Micromachines 2020, 11, 211.
https://doi.org/10.3390/mi11020211
AMA Style
De Teresa JM, Orús P, Córdoba R, Philipp P.
Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. Micromachines. 2020; 11(2):211.
https://doi.org/10.3390/mi11020211
Chicago/Turabian Style
De Teresa, José María, Pablo Orús, Rosa Córdoba, and Patrick Philipp.
2020. "Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799" Micromachines 11, no. 2: 211.
https://doi.org/10.3390/mi11020211
APA Style
De Teresa, J. M., Orús, P., Córdoba, R., & Philipp, P.
(2020). Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. Micromachines, 11(2), 211.
https://doi.org/10.3390/mi11020211