Yang, S.-D.; Jung, J.-K.; Lim, J.-G.; Park, S.-g.; Lee, H.-D.; Lee, G.-W.
Investigation of Intra-Nitride Charge Migration Suppression in SONOS Flash Memory. Micromachines 2019, 10, 356.
https://doi.org/10.3390/mi10060356
AMA Style
Yang S-D, Jung J-K, Lim J-G, Park S-g, Lee H-D, Lee G-W.
Investigation of Intra-Nitride Charge Migration Suppression in SONOS Flash Memory. Micromachines. 2019; 10(6):356.
https://doi.org/10.3390/mi10060356
Chicago/Turabian Style
Yang, Seung-Dong, Jun-Kyo Jung, Jae-Gab Lim, Seong-gye Park, Hi-Deok Lee, and Ga-Won Lee.
2019. "Investigation of Intra-Nitride Charge Migration Suppression in SONOS Flash Memory" Micromachines 10, no. 6: 356.
https://doi.org/10.3390/mi10060356
APA Style
Yang, S.-D., Jung, J.-K., Lim, J.-G., Park, S.-g., Lee, H.-D., & Lee, G.-W.
(2019). Investigation of Intra-Nitride Charge Migration Suppression in SONOS Flash Memory. Micromachines, 10(6), 356.
https://doi.org/10.3390/mi10060356