Galvão, N.; Guerino, M.; Campos, T.; Grigorov, K.; Fraga, M.; Rodrigues, B.; Pessoa, R.; Camus, J.; Djouadi, M.; Maciel, H.
The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. Micromachines 2019, 10, 202.
https://doi.org/10.3390/mi10030202
AMA Style
Galvão N, Guerino M, Campos T, Grigorov K, Fraga M, Rodrigues B, Pessoa R, Camus J, Djouadi M, Maciel H.
The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. Micromachines. 2019; 10(3):202.
https://doi.org/10.3390/mi10030202
Chicago/Turabian Style
Galvão, Nierlly, Marciel Guerino, Tiago Campos, Korneli Grigorov, Mariana Fraga, Bruno Rodrigues, Rodrigo Pessoa, Julien Camus, Mohammed Djouadi, and Homero Maciel.
2019. "The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering" Micromachines 10, no. 3: 202.
https://doi.org/10.3390/mi10030202
APA Style
Galvão, N., Guerino, M., Campos, T., Grigorov, K., Fraga, M., Rodrigues, B., Pessoa, R., Camus, J., Djouadi, M., & Maciel, H.
(2019). The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. Micromachines, 10(3), 202.
https://doi.org/10.3390/mi10030202