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Journal: Micromachines, 2019
Volume: 10
Number: 192
Article:
Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting
Authors:
by
Prithviraj Mukherjee, Federico Nebuloni, Hua Gao, Jian Zhou and Ian Papautsky
Link:
https://www.mdpi.com/2072-666X/10/3/192
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