Veis, M.; Antos, R.; Visnovsky, S.; Kulkarni, P.D.; Venkataramani, N.; Prasad, S.; Mistrik, J.; Krishnan, R.
Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV. Materials 2013, 6, 4096-4108.
https://doi.org/10.3390/ma6094096
AMA Style
Veis M, Antos R, Visnovsky S, Kulkarni PD, Venkataramani N, Prasad S, Mistrik J, Krishnan R.
Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV. Materials. 2013; 6(9):4096-4108.
https://doi.org/10.3390/ma6094096
Chicago/Turabian Style
Veis, Martin, Roman Antos, Stefan Visnovsky, Prasanna D. Kulkarni, Narayanan Venkataramani, Shiva Prasad, Jan Mistrik, and Ramanathan Krishnan.
2013. "Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV" Materials 6, no. 9: 4096-4108.
https://doi.org/10.3390/ma6094096
APA Style
Veis, M., Antos, R., Visnovsky, S., Kulkarni, P. D., Venkataramani, N., Prasad, S., Mistrik, J., & Krishnan, R.
(2013). Complete Permittivity Tensor in Sputtered CuFe2O4 Thin Films at Photon Energies between 2 and 5 eV. Materials, 6(9), 4096-4108.
https://doi.org/10.3390/ma6094096
