Yong, Z.; Liu, T.; Uruga, T.; Tanida, H.; Qi, D.; Rusydi, A.; Wee, A.T.S.
Ti-doped ZnO Thin Films Prepared at Different Ambient Conditions: Electronic Structures and Magnetic Properties. Materials 2010, 3, 3642-3653.
https://doi.org/10.3390/ma3063642
AMA Style
Yong Z, Liu T, Uruga T, Tanida H, Qi D, Rusydi A, Wee ATS.
Ti-doped ZnO Thin Films Prepared at Different Ambient Conditions: Electronic Structures and Magnetic Properties. Materials. 2010; 3(6):3642-3653.
https://doi.org/10.3390/ma3063642
Chicago/Turabian Style
Yong, Zhihua, Tao Liu, Tomoya Uruga, Hajime Tanida, Dongchen Qi, Andrivo Rusydi, and Andrew T. S. Wee.
2010. "Ti-doped ZnO Thin Films Prepared at Different Ambient Conditions: Electronic Structures and Magnetic Properties" Materials 3, no. 6: 3642-3653.
https://doi.org/10.3390/ma3063642
APA Style
Yong, Z., Liu, T., Uruga, T., Tanida, H., Qi, D., Rusydi, A., & Wee, A. T. S.
(2010). Ti-doped ZnO Thin Films Prepared at Different Ambient Conditions: Electronic Structures and Magnetic Properties. Materials, 3(6), 3642-3653.
https://doi.org/10.3390/ma3063642
