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Journal: Materials, 2026
Volume: 19
Number: 804

Article: Effect of Duty Cycle on Amorphous Silicon Carbon Nitride Films Deposited by Microwave Sheath–Voltage Combination Plasma
Authors: by Ippei Tanaka, Yuki Hatae and Yasunori Harada
Link: https://www.mdpi.com/1996-1944/19/4/804

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