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Article

Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering

by
Djallel Eddine Touaibia
1,2,*,
Sofiane Achache
1,2,
Abdelhakim Bouissil
1,2,
Fabrice Parent
1,2,
Jaafar Ghanbaja
3,
Alina Gorbunova
4,
Pavel S. Postnikov
4,
Mohamed Mehdi Chehimi
5,
Frederic Schuster
6,
Frederic Sanchette
1,2 and
Mohamed El Garah
1,2,*
1
LASMIS—Laboratory of Mechanical & Materials Engineering, Antenne de Nogent-52, Pôle Technologique de Sud-Champagne, 52800 Nogent, France
2
LRC CEA-LASMIS, Nogent International Centre for Coating Innovation (NICCI), Pôle Technologique de Sud-Champagne, 52800 Nogent, France
3
Institut Jean Lamour (UMR CRS 7198), Université de Lorraine, 54000 Nancy, France
4
Research School of Chemistry and Applied Biomedical Sciences, Tomsk Polytechnic University, Tomsk 634050, Russia
5
ITODYS, CNRS, UMR 7086, University of Paris, 15 rue JA de Baïf, 75013 Paris, France
6
Commissariat à l’Energie Atomique et aux énergies Alternatives (CEA) Saclay, 91191 Gif-sur Yvette, France
*
Authors to whom correspondence should be addressed.
Materials 2024, 17(12), 2799; https://doi.org/10.3390/ma17122799
Submission received: 7 May 2024 / Revised: 1 June 2024 / Accepted: 4 June 2024 / Published: 7 June 2024
(This article belongs to the Special Issue Preparation of Thin Films by PVD/CVD Deposition Techniques)
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Abstract

This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)Nx/SiNx refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiNx nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young’s modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiNx nano-layer, kp values decrease significantly from 3.36 × 10−8 g2 cm−4 h−1 to 6.06 × 10−9 g2 cm−4 h−1. The activation energy increases from 90.8 kJ·mol−1 for (AlTiZrHfTa)Nx nitride coating to 126.52 kJ·mol−1 for the (AlTiZrHfTa)Nx/SiNx nano-layered coating. The formation of a FCC (AlTiZrHfTa)-Nx/a-SiNx nano-layered architecture results in the improvement of the resistance to oxidation at high temperature.
Keywords: high-entropy alloys; coatings; magnetron sputtering; (AlTiZrHfTa)/SiNx; oxidation; nano-layered high-entropy alloys; coatings; magnetron sputtering; (AlTiZrHfTa)/SiNx; oxidation; nano-layered

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MDPI and ACS Style

Touaibia, D.E.; Achache, S.; Bouissil, A.; Parent, F.; Ghanbaja, J.; Gorbunova, A.; Postnikov, P.S.; Chehimi, M.M.; Schuster, F.; Sanchette, F.; et al. Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering. Materials 2024, 17, 2799. https://doi.org/10.3390/ma17122799

AMA Style

Touaibia DE, Achache S, Bouissil A, Parent F, Ghanbaja J, Gorbunova A, Postnikov PS, Chehimi MM, Schuster F, Sanchette F, et al. Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering. Materials. 2024; 17(12):2799. https://doi.org/10.3390/ma17122799

Chicago/Turabian Style

Touaibia, Djallel Eddine, Sofiane Achache, Abdelhakim Bouissil, Fabrice Parent, Jaafar Ghanbaja, Alina Gorbunova, Pavel S. Postnikov, Mohamed Mehdi Chehimi, Frederic Schuster, Frederic Sanchette, and et al. 2024. "Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering" Materials 17, no. 12: 2799. https://doi.org/10.3390/ma17122799

APA Style

Touaibia, D. E., Achache, S., Bouissil, A., Parent, F., Ghanbaja, J., Gorbunova, A., Postnikov, P. S., Chehimi, M. M., Schuster, F., Sanchette, F., & El Garah, M. (2024). Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering. Materials, 17(12), 2799. https://doi.org/10.3390/ma17122799

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