Liao, R.-Y.; Chen, H.-H.; Lin, P.-Y.; Liang, T.-A.; Su, K.-H.; Lin, I.-C.; Wen, C.-H.; Chou, W.-C.; Hsu, H.-H.; Cheng, C.-H.
Ferroelectricity and Oxide Reliability of Stacked Hafnium–Zirconium Oxide Devices. Materials 2023, 16, 3306.
https://doi.org/10.3390/ma16093306
AMA Style
Liao R-Y, Chen H-H, Lin P-Y, Liang T-A, Su K-H, Lin I-C, Wen C-H, Chou W-C, Hsu H-H, Cheng C-H.
Ferroelectricity and Oxide Reliability of Stacked Hafnium–Zirconium Oxide Devices. Materials. 2023; 16(9):3306.
https://doi.org/10.3390/ma16093306
Chicago/Turabian Style
Liao, Ruo-Yin, Hsuan-Han Chen, Ping-Yu Lin, Ting-An Liang, Kuan-Hung Su, I-Cheng Lin, Chen-Hao Wen, Wu-Ching Chou, Hsiao-Hsuan Hsu, and Chun-Hu Cheng.
2023. "Ferroelectricity and Oxide Reliability of Stacked Hafnium–Zirconium Oxide Devices" Materials 16, no. 9: 3306.
https://doi.org/10.3390/ma16093306
APA Style
Liao, R.-Y., Chen, H.-H., Lin, P.-Y., Liang, T.-A., Su, K.-H., Lin, I.-C., Wen, C.-H., Chou, W.-C., Hsu, H.-H., & Cheng, C.-H.
(2023). Ferroelectricity and Oxide Reliability of Stacked Hafnium–Zirconium Oxide Devices. Materials, 16(9), 3306.
https://doi.org/10.3390/ma16093306
