Article Versions Notes

Zhao Z, Zhang Z, Shi C, Feng J, Zhuang X, Li L, Meng F, Li H, Xue Z, Liu D. Dispersion and Polishing Mechanism of a Novel CeO₂-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass. Materials. 2023; 16(3):1148. https://doi.org/10.3390/ma16031148

Zhao, Zifeng, Zhenyu Zhang, Chunjing Shi, Junyuan Feng, Xuye Zhuang, Li Li, Fanning Meng, Haodong Li, Zihang Xue, and Dongdong Liu. 2023. "Dispersion and Polishing Mechanism of a Novel CeO₂-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass" Materials 16, no. 3: 1148. https://doi.org/10.3390/ma16031148

Zhao, Z., Zhang, Z., Shi, C., Feng, J., Zhuang, X., Li, L., Meng, F., Li, H., Xue, Z., & Liu, D. (2023). Dispersion and Polishing Mechanism of a Novel CeO₂-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass. Materials, 16(3), 1148. https://doi.org/10.3390/ma16031148