Choi, M.; Lee, Y.; You, Y.; Cho, C.; Jeong, W.; Seong, I.; Choi, B.; Kim, S.; Seol, Y.; You, S.;
et al. Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials 2023, 16, 5624.
https://doi.org/10.3390/ma16165624
AMA Style
Choi M, Lee Y, You Y, Cho C, Jeong W, Seong I, Choi B, Kim S, Seol Y, You S,
et al. Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials. 2023; 16(16):5624.
https://doi.org/10.3390/ma16165624
Chicago/Turabian Style
Choi, Minsu, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You,
and et al. 2023. "Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction" Materials 16, no. 16: 5624.
https://doi.org/10.3390/ma16165624
APA Style
Choi, M., Lee, Y., You, Y., Cho, C., Jeong, W., Seong, I., Choi, B., Kim, S., Seol, Y., You, S., & Yeom, G. Y.
(2023). Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials, 16(16), 5624.
https://doi.org/10.3390/ma16165624