Jeong, J.H.; Kim, M.G.; Ma, J.H.; Park, M.H.; Ha, H.J.; Kang, S.J.; Maeng, M.-J.; Kim, Y.D.; Park, Y.; Kang, S.J.
Improving the Performance of Solution−Processed Quantum Dot Light−Emitting Diodes via a HfOx Interfacial Layer. Materials 2022, 15, 8977.
https://doi.org/10.3390/ma15248977
AMA Style
Jeong JH, Kim MG, Ma JH, Park MH, Ha HJ, Kang SJ, Maeng M-J, Kim YD, Park Y, Kang SJ.
Improving the Performance of Solution−Processed Quantum Dot Light−Emitting Diodes via a HfOx Interfacial Layer. Materials. 2022; 15(24):8977.
https://doi.org/10.3390/ma15248977
Chicago/Turabian Style
Jeong, Jun Hyung, Min Gye Kim, Jin Hyun Ma, Min Ho Park, Hyoun Ji Ha, Seong Jae Kang, Min-Jae Maeng, Young Duck Kim, Yongsup Park, and Seong Jun Kang.
2022. "Improving the Performance of Solution−Processed Quantum Dot Light−Emitting Diodes via a HfOx Interfacial Layer" Materials 15, no. 24: 8977.
https://doi.org/10.3390/ma15248977
APA Style
Jeong, J. H., Kim, M. G., Ma, J. H., Park, M. H., Ha, H. J., Kang, S. J., Maeng, M.-J., Kim, Y. D., Park, Y., & Kang, S. J.
(2022). Improving the Performance of Solution−Processed Quantum Dot Light−Emitting Diodes via a HfOx Interfacial Layer. Materials, 15(24), 8977.
https://doi.org/10.3390/ma15248977