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Journal: Materials, 2021
Volume: 14
Number: 1432

Article: On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures
Authors: by Alexander Efremov, Byung Jun Lee and Kwang-Ho Kwon
Link: https://www.mdpi.com/1996-1944/14/6/1432

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