Yang, Y.-P.; Lu, T.-Y.; Lo, H.-H.; Chen, W.-L.; Wang, P.J.; Lai, W.; Fuh, Y.-K.; Li, T.T.
Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data. Materials 2021, 14, 4445.
https://doi.org/10.3390/ma14164445
AMA Style
Yang Y-P, Lu T-Y, Lo H-H, Chen W-L, Wang PJ, Lai W, Fuh Y-K, Li TT.
Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data. Materials. 2021; 14(16):4445.
https://doi.org/10.3390/ma14164445
Chicago/Turabian Style
Yang, Yu-Pu, Te-Yun Lu, Hsiao-Han Lo, Wei-Lun Chen, Peter J. Wang, Walter Lai, Yiin-Kuen Fuh, and Tomi T. Li.
2021. "Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data" Materials 14, no. 16: 4445.
https://doi.org/10.3390/ma14164445
APA Style
Yang, Y.-P., Lu, T.-Y., Lo, H.-H., Chen, W.-L., Wang, P. J., Lai, W., Fuh, Y.-K., & Li, T. T.
(2021). Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data. Materials, 14(16), 4445.
https://doi.org/10.3390/ma14164445