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Article

Comparison between the UV and X-ray Photosensitivities of Hybrid TiO2-SiO2 Thin Layers

Univ Lyon, Laboratoire H. Curien, UJM-CNRS-IOGS, 18 rue du Pr. 42000 Benoît Lauras, Saint-Etienne, France
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Materials 2020, 13(17), 3730; https://doi.org/10.3390/ma13173730
Received: 24 July 2020 / Revised: 14 August 2020 / Accepted: 21 August 2020 / Published: 24 August 2020
(This article belongs to the Special Issue Sol-Gel-Derived Materials)
The photo-induced effects on sol–gel-based organo TiO2-SiO2 thin layers deposited by the dip-coating technique have been investigated using two very different light sources: A light-emitting diode (LED) emitting in the UV (at 365 nm, 3.4 eV) and an X-ray tube producing 40 keV mean-energy photons. The impact of adding a photo-initiator (2,2-dimethoxy-2-phenylacetophenone-DMPA) on the sol–gel photosensitivity is characterized namely in terms of the photo-induced refractive index measured through M-line spectroscopy. Results show that both silica-titania sol–gel films with or without the photo-initiator are photosensitive to both photon sources. The induced refractive index values reveal several features where slightly higher refractive indexes are obtained for the sol–gel containing the photo-initiator. UV and X-ray-induced polymerization degrees are discussed using Fourier-transform infrared (FTIR) spectroscopy where the densification of hybrid TiO2-SiO2 layers is related to the consumption of the CH=C groups and to the decomposition of Si-OH and Si-O-CH3 bonds. X-rays are more efficient at densifying the TiO2-SiO2 inorganic and organic network with respect to the UV photons. Hard X-ray photolithography, where no cracks or damages are observed after intense exposition, can be a promising technique to design submicronic-structure patterns on TiO2-SiO2 thin layers for the building of optical sensors. View Full-Text
Keywords: sol–gel materials; X-ray photolithography; FTIR spectroscopy; photopolymerization sol–gel materials; X-ray photolithography; FTIR spectroscopy; photopolymerization
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MDPI and ACS Style

Royon, M.; Vocanson, F.; Jamon, D.; Marin, E.; Morana, A.; Boukenter, A.; Girard, S.; Ouerdane, Y.; Royer, F.; Jourlin, Y. Comparison between the UV and X-ray Photosensitivities of Hybrid TiO2-SiO2 Thin Layers. Materials 2020, 13, 3730. https://doi.org/10.3390/ma13173730

AMA Style

Royon M, Vocanson F, Jamon D, Marin E, Morana A, Boukenter A, Girard S, Ouerdane Y, Royer F, Jourlin Y. Comparison between the UV and X-ray Photosensitivities of Hybrid TiO2-SiO2 Thin Layers. Materials. 2020; 13(17):3730. https://doi.org/10.3390/ma13173730

Chicago/Turabian Style

Royon, Maxime, Francis Vocanson, Damien Jamon, Emmanuel Marin, Adriana Morana, Aziz Boukenter, Sylvain Girard, Youcef Ouerdane, François Royer, and Yves Jourlin. 2020. "Comparison between the UV and X-ray Photosensitivities of Hybrid TiO2-SiO2 Thin Layers" Materials 13, no. 17: 3730. https://doi.org/10.3390/ma13173730

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